RMS (left robotic workcell) transfers reticles
between three separate SMIF (Standard Mechanical Interface)
mini-environment pods
that provide a total of 18 storage bays.
Robot aligns and transfers a reticle to the lithography stage using machine vision feedback to
achieve sub micron positioning and micro radian orientation
alignment.
Separate transfer mechanism unloads
stage reticle in parallel with robot loading and completes the quick
exchange cycle.
Reprinted with permission
from ASML US, Inc. All Rights Reserved.
Problem
Automate the loading and storing of
reticles inside a lithography tool:
store reticles for use in memory,
ASIC, and logic fabs
load reticles to a precision
lithography positioning stage within course alignment targets
facilitate quick exchange cycle
times when loading and unloading
Design all components to work in a
Class 1 Clean room environment:
no particulate contamination from
moving rubbing parts
